ProSys - 30/450 Dual Zone MegPie

Dual Zone MegPie 300/450

The ProSys Dual Zone MegPie 300/450 is a single-wafer Megasonic transducer for cleaning and sonochemical processing of a 300mm or 450mm substrate in one chamber. It applies a uniform dose of acoustic energy to a rotating round or rectangular substrate. The MegPie will improve process efficiency and lower process time. And it is easy to retrofit to your single-substrate processing tool.

•	Can process two sizes of substrates: 300mm and 450mm

•	The sapphire resonator is particle neutral; it will not add particles to the process

•	Patented crystal bond to the resonator

•	Patented RF connection to the crystal

•	Redundant internal RTD temperature monitoring

•	Sapphire resonator is compatible with all processing chemistries

•	Uniform direct acoustic energy applied to the process

•	Increased process efficiency

•	Reduced process time

•	Reduced process chemistry usage

•	No moving parts, no consumables

•	Replaces brushes and nozzles

•	Power density: 0.05 – 2.0 Watts/cm2

•	Standard operating frequency: 925 kHz; other frequencies available upon request

•	Mounting height: 0.02”– 0.14” (0.5mm – 3.5mm)

•	Process fluid temperature: 15°C – 60°C

•	Process fluid required depends on the substrate size and RPM: 0.5 – 3.0 lpm

•	Operating RPM: 1 – 75

•	Nitrogen or CDA purge: 10 lpm

•	Mounting with 3 x M6 female threaded bosses

•	Post-CMP cleaning	•	LIGA processes

•	TSV processing	•	Mask cleaning

•	Pre-SOIC bond cleaning	•	Etch assist

•	SU-8 develop	•	Plating pre-cleaning

•	Lift off	•	Pre-plating bubble removal

•	Resist strip	•	Post-laser cleaning

Quick Response

Technical Information

Specifications

Processes Supported

Product Note
with specs and drawings (PDF)