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Powerful Solutions for Critical Cleaning
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ProSys Megasonic cleaning systems and technology can enable you to:
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Quickly, safely, and effectively clean contamination-sensitive products
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Improve your removal efficiency to above 99%
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Reduce process time
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Using high-frequency acoustic energy, our advanced megasonics technology enables you to more tightly control your process and to make it faster and more efficient.
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Problems we solve include:
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FEOL and BEOL cleans
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Post-CMP/polish cleaning
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Thick resist develop such as SU-8™
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TSV process enhancement and residual glue removal
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LIGA/MEMS process enhancements
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Solar process enhancement
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Working with ProSys offers:
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A wide range of solutions for both single wafer and batch cleaning.
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Custom Megasonic cleaning system designs to solve a variety of difficult contamination-sensitive cleaning issues.
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Proprietary Direct Technology that improves reliability, uptime and yields.
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Repair and replacement services for your existing Megasonic systems. (details)
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A high level of support – including help with process optimization.
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Access to the latest developments in cleaning and continual advancements in megasonic technology.
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<empty>NEWS<empty>
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ProSys Announces the MegPie Retrofit Kit for DNS 80A/B Brush Scrubbers
read more
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ProSys Announces Delivery of 300/450 MegPie to Europe
read more
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<empty>EVENTS<empty>
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Semicon Europa, See us at Stand no. 1.746 SPS-Europe BV.
details
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