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Powerful Solutions for Critical Cleaning
ProSys Megasonic cleaning systems and technology can enable you to:
| • | Quickly, safely, and effectively clean contamination-sensitive products |
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| • | Improve your removal efficiency to above 99% |
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| • | Reduce process time |
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Using high-frequency acoustic energy, our advanced megasonics technology enables you to more tightly control your process and to make it faster and more efficient. |
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Problems we solve include:
| • | FEOL and BEOL cleans |
| • | Post-CMP/polish cleaning |
| • | Thick resist develop such as SU-8™ |
| • | TSV process enhancement and residual glue removal |
| • | LIGA/MEMS process enhancements |
| • | Solar process enhancement |
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Working with ProSys offers:
| • | A wide range of solutions for both single wafer and batch cleaning. |
| • | Custom Megasonic cleaning system designs to solve a variety of difficult contamination-sensitive cleaning issues. |
| • | Proprietary Direct Technology that improves reliability, uptime and yields. |
| • | Repair and replacement services for your existing Megasonic systems. (details) |
| • | A high level of support – including help with process optimization. |
| • | Access to the latest developments in cleaning and continual advancements in megasonic technology. |
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| NEWS |
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| EVENTS |
UCPSS September 11-14, 2016 Knokke-Heist, Belgium ECS October 2-7, 2016 Honolulu, Hawaii pa, See us at Stand no. 1.746 SPS-Europe BV. details |
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